JPH0385632U - - Google Patents

Info

Publication number
JPH0385632U
JPH0385632U JP14699689U JP14699689U JPH0385632U JP H0385632 U JPH0385632 U JP H0385632U JP 14699689 U JP14699689 U JP 14699689U JP 14699689 U JP14699689 U JP 14699689U JP H0385632 U JPH0385632 U JP H0385632U
Authority
JP
Japan
Prior art keywords
electron beam
outline
input
data
lithography device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14699689U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14699689U priority Critical patent/JPH0385632U/ja
Publication of JPH0385632U publication Critical patent/JPH0385632U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP14699689U 1989-12-22 1989-12-22 Pending JPH0385632U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14699689U JPH0385632U (en]) 1989-12-22 1989-12-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14699689U JPH0385632U (en]) 1989-12-22 1989-12-22

Publications (1)

Publication Number Publication Date
JPH0385632U true JPH0385632U (en]) 1991-08-29

Family

ID=31693530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14699689U Pending JPH0385632U (en]) 1989-12-22 1989-12-22

Country Status (1)

Country Link
JP (1) JPH0385632U (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003059795A (ja) * 2001-08-08 2003-02-28 Sony Corp 描画用パターンの分割処理方法、描画用パターンの分割処理装置、描画方法、マスク、マスクの作成方法、半導体装置、半導体装置の製造方法、描画用パターンの分割処理プログラム及びこのプログラムを記録したコンピュータ読みとり可能な記録媒体
JP2014165334A (ja) * 2013-02-25 2014-09-08 National Institute Of Advanced Industrial & Technology 電子ビーム露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003059795A (ja) * 2001-08-08 2003-02-28 Sony Corp 描画用パターンの分割処理方法、描画用パターンの分割処理装置、描画方法、マスク、マスクの作成方法、半導体装置、半導体装置の製造方法、描画用パターンの分割処理プログラム及びこのプログラムを記録したコンピュータ読みとり可能な記録媒体
JP2014165334A (ja) * 2013-02-25 2014-09-08 National Institute Of Advanced Industrial & Technology 電子ビーム露光方法

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